New Wooptix Poster at SPIE Advanced Lithography and Patterning Jan O. Gaudestad presented the Poster “A new optical metrology technique for measuring the shape of a lithography photomask” MADRID- 29th.02.24 SPIE Advanced Lithography and Patterning Conference, taking place between February 25th and February 28th in San Jose (California), took the attention from the entire semiconductor […]
New technique for measuring free-form wafer shape for feed-forward overlay corrections will be highlighted at SPIE EUV Lithography 2023 Wooptix will present a scientific paper at SPIE EUV Lithography, held in Monterey California October 1st through October 5th under the title “New technique for measuring free-form wafer shape for feed-forward overlay corrections” written in […]
Jan Olaf Gaudestad, Wooptix VP of Business Development will present a poster session from 12.30 to 13.30 the Wednesday 28th, with the last research advances in Semiconductors Metrology. Madrid June 2023. Wooptix, Leader in Semiconductor Metrology through wavefront phase imaging, will participate in the Munich SPIE Optical Metrology from 26th to 29th June. This event […]