New Optical Metrology Method for Measuring Shape of a Lithography Photo Mask Wooptix participates in the 39th Mask and Lithography Conference in Grenoble, presenting its latest results in Optical Metrology Wooptix has recently presented a groundbreaking optical metrology method at the 39th Mask and Lithography Conference in Grenoble. This new technique promises to revolutionize the […]
Wooptix and Prodrive Technologies sign declaration of intent for strategic partnership The partnership is aimed at supporting Wooptixs’ development in semiconductor metrology through WaveFront Phase Imaging (WFPI) SCIENCE PARK EINDHOVEN (date, 2024) Prodrive Technologies and Wooptix have signed a memorandum of understanding to further strengthen their long-term strategic partnership. The partnership is aimed at supporting […]
New Wooptix Poster at SPIE Advanced Lithography and Patterning Jan O. Gaudestad presented the Poster “A new optical metrology technique for measuring the shape of a lithography photomask” MADRID- 29th.02.24 SPIE Advanced Lithography and Patterning Conference, taking place between February 25th and February 28th in San Jose (California), took the attention from the entire semiconductor […]